Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

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dc.contributor.author	Ma, Qiang
dc.contributor.author	Gordon, Roy Gerald
dc.contributor.author	Zaera, Francisco
dc.date.accessioned	2012-09-25T18:20:08Z
dc.date.issued	2011
dc.identifier.citation	Ma, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.	en_US
dc.identifier.uri	http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953
dc.description.sponsorship	Chemistry and Chemical Biology	en_US
dc.language.iso	en_US	en_US
dash.license	LAA
dc.title	Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes	en_US
dc.type	Conference Paper	en_US
dc.description.version	Author's Original	en_US
dash.depositing.author	Gordon, Roy Gerald
dc.date.available	2012-09-25T18:20:08Z