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Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

dc.contributor.authorMa, Qiang
dc.contributor.authorGordon, Roy Gerald
dc.contributor.authorZaera, Francisco
dc.date.accessioned2012-09-25T18:20:08Z
dc.date.issued2011
dc.identifier.citationMa, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953
dc.description.sponsorshipChemistry and Chemical Biologyen_US
dc.language.isoen_USen_US
dash.licenseLAA
dc.titleSurface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processesen_US
dc.typeConference Paperen_US
dc.description.versionAuthor's Originalen_US
dash.depositing.authorGordon, Roy Gerald
dc.date.available2012-09-25T18:20:08Z
dash.contributor.affiliatedGordon, Roy


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