Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

Ma, QiangGordon, RoyZaera, Francisco2012-09-252011Ma, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953en-USSurface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) ProcessesConference Paper2012-09-25