Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films

Yang, JingLi, KechengFeng, JunGordon, Roy2017-08-082015Yang, Jing, Kecheng Li, Jun Feng, and Roy G. Gordon. 2015. “Direct-Liquid-Evaporation Chemical Vapor Deposition of Smooth, Highly Conformal Cobalt and Cobalt Nitride Thin Films.” J. Mater. Chem. C 3 (46): 12098–12106. doi:10.1039/c5tc03221k.2050-7526http://nrs.harvard.edu/urn-3:HUL.InstRepos:33724769en-USDirect-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin filmsJournal Article2015-11-20Yang, Jing; Li, Kecheng; Feng, Jun; Gordon, Roy G.10.1039/c5tc03221k