Maskless photolithography: Embossed photoresist as its own optical element

Paul, Kateri E.Breen, Tricia L.Aizenberg, JoannaWhitesides, George2022-12-211998-11-16Paul, Kateri E., Tricia L. Breen, Joanna Aizenberg, George Whitesides. "Maskless photolithography: Embossed photoresist as its own optical element." Appl. Phys. Lett. 73, no. 20 (1998): 2893-2895. DOI: 10.1063/1.1226210003-69511077-3118https://nrs.harvard.edu/URN-3:HUL.INSTREPOS:37373922en-USPhysics and Astronomy (miscellaneous)Maskless photolithography: Embossed photoresist as its own optical elementJournal Article2018-05-1719982022-12-2110.1063/1.122621