Ice Lithography for Nano-Devices

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Ice Lithography for Nano-Devices

Show simple item record Branton, Daniel Han, Anpan Vlassarev, Dimitar Mihaylov Wang, Jenny Yingzi Golovchenko, Jene A. 2011-01-04T14:42:09Z 2010
dc.identifier.citation Han, Anpan, Dimitar Vlassarev, Jenny Wang, Jene A. Golvchenko, and Daniel Branton. 2010. Nano Letters 10(12): 5056-5059. en_US
dc.identifier.issn 1530-6984 en_US
dc.description.abstract We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication. We show that labile nanostructures such as carbon nanotubes can be safely imaged in an SEM when coated in ice. The ice film is patterned at high e-beam intensity and serves as a mask for lift-off without the device degradation and contamination associated with e-beam imaging and polymer resist residues. We demonstrate the IL preparation of carbon nanotubes field effect transistors (FETs) with high quality trans-conductance properties. en_US
dc.description.sponsorship Engineering and Applied Sciences en_US
dc.description.sponsorship Molecular and Cellular Biology en_US
dc.description.sponsorship Physics en_US
dc.language.iso en_US en_US
dc.publisher American Chemical Society en_US
dc.relation.isversionof doi:10.1021/nl1032815 en_US
dash.license OAP
dc.subject e-beam lithography en_US
dc.subject carbon nanotube en_US
dc.subject field effect transistor en_US
dc.subject nano-device en_US
dc.title Ice Lithography for Nano-Devices en_US
dc.type Journal Article en_US
dc.description.version Accepted Manuscript en_US
dc.relation.journal Nano Letters en_US Branton, Daniel 2011-01-04T14:42:09Z

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