(AIP Publishing, 2003) Peng, H. B.; Ristroph, T. G.; Schurmann, G. M.; King, G. M.; Yoon, J.; Narayanamurti, Venkatesh; Golovchenko, Jene
Single-walled carbon nanotubes have been grown on a variety of substrates by chemical vapor deposition using low-coverage vacuum-deposited iron as a catalyst. Ordered arrays of suspended nanotubes ranging from submicron to several micron lengths have been obtained on Si, SiO2,SiO2, Al2O3,Al2O3, and Si3N4Si3N4 substrates that were patterned on hundred nanometer length scales with a focused ion beam machine. Electric fields applied during nanotubegrowth allow the control of growth direction. Nanotube circuits have been constructed directly on contacting metal electrodes of Pt/Cr patterned with catalysts. Patterning with solid iron catalyst is compatible with modern semiconductor fabrication strategies and may contribute to the integration of nanotubes in complex device architectures.
