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Schaus, Thomas

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Schaus

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Thomas

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Schaus, Thomas

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Now showing 1 - 4 of 4
  • Publication

    Programmable autonomous synthesis of single-stranded DNA

    (2017) Kishi, Jocelyn; Schaus, Thomas; Gopalkrishnan, Nikhil; Xuan, Feng; Yin, Peng

    DNA performs diverse functional roles in biology, nanotechnology, and biotechnology, but current methods for autonomously synthesizing arbitrary single-stranded DNA are limited. Here, we introduce the concept of Primer Exchange Reaction (PER) cascades, which grow nascent single-stranded DNA with user-specified sequences following prescribed reaction pathways. PER synthesis happens in a programmable, autonomous, in situ, and environmentally responsive fashion, providing a platform for engineering molecular circuits and devices with a wide range of sensing, monitoring, recording, signal processing, and actuation capabilities. We experimentally demonstrate a nanodevice that transduces the detection of a trigger RNA into the production of a DNAzyme that degrades an independent RNA substrate, a signal amplifier that conditionally synthesizes long fluorescent strands only in the presence of a particular RNA signal, molecular computing circuits that evaluate logic (AND, OR, NOT) combinations of RNA inputs, and a temporal molecular event recorder that records in the PER transcript the order in which distinct RNA inputs are sequentially detected.

  • Publication

    A DNA nanoscope via auto-cycling proximity recording

    (Nature Publishing Group UK, 2017) Schaus, Thomas; Woo, Sungwook; Xuan, Feng; Chen, Xi; Yin, Peng

    Analysis of the spatial arrangement of molecular features enables the engineering of synthetic nanostructures and the understanding of natural ones. The ability to acquire a comprehensive set of pairwise proximities between components would satisfy an increasing interest in investigating individual macromolecules and their interactions, but current biochemical techniques detect only a single proximity partner per probe. Here, we present a biochemical DNA nanoscopy method that records nanostructure features in situ and in detail for later readout. Based on a conceptually novel auto-cycling proximity recording (APR) mechanism, it continuously and repeatedly produces proximity records of any nearby pairs of DNA-barcoded probes, at physiological temperature, without altering the probes themselves. We demonstrate the production of dozens of records per probe, decode the spatial arrangements of 7 unique probes in a homogeneous sample, and repeatedly sample the same probes in different states.

  • Publication

    Precise Pitch-Scaling of Carbon Nanotube Arrays Within Three-Dimensional DNA Nanotrenches

    (American Association for the Advancement of Science (AAAS), 2020-05-21) Sun, Wei; Shen, Jie; Zhao, Zhao; Arellano, Noel; Rettner, Charles; Tang, Jianshi; Cao, Tianyang; Zhou, Zhiyu; Ta, Toan; Streit, Jason K.; Fagan, Jeffrey A.; Schaus, Thomas; Zheng, Ming; Han, Shu-Jen; Shih, William; Maune, Hareem T.; Yin, Peng

    Precise fabrication of semiconducting carbon nanotubes (CNTs) into densely-aligned evenly-spaced arrays is required for the ultra-scaled technology nodes. We report the precise scaling of inter-CNT pitch using a supramolecular assembly method called spatially hindered integration of nanotube electronics (SHINE). Specifically, by using DNA brick crystal based nanotrenches to align DNA-wrapped CNTs through DNA hybridization, we constructed parallel CNT arrays with uniform pitch as small as 10.4 nanometers, at an angular deviation less than 2 degrees and an assembly yield > 95%.

  • Publication

    Three-Dimensional Nanolithography Guided by DNA Modular Epitaxy

    (Springer Science and Business Media LLC, 2021-04-12) Shen, Jie; Sun, Wei; Liu, Di; Schaus, Thomas; Yin, Peng

    Lithographic scaling of periodic three-dimensional patterns is critical for advancing scalable nanomanufacturing. Current state-of-the-art quadruple patterning or extreme-UV lithography produce line pitch down to around 30 nm, which can be further improved to sub-20 nm through complex post-fabrication processes. Herein, we report the use of three-dimensional (3D) DNA nanostructures to scale the line pitch down to 16.2 nm, around 50 % smaller than current state-of-the-art results. We use a DNA modular epitaxy approach to fabricate scaled 3D DNA masks with prescribed structural parameters (pitch, shape, and critical dimensions) along a designer assembly pathway. Single-run reactive ion etching then transfers the DNA patterns to a Si substrate at a lateral resolution of 7 nm and a vertical resolution of 2 nm. The DNA modular epitaxy-directed lithography achieves smaller pitch than the projected values for advanced technology node in field-effect transistors, and provides a potential complement to the existing lithographic tools towards advanced 3D nanomanufacturing.