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Davis, Luke

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Davis

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Luke

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Davis, Luke
Author's Publications: search.filters.isAuthorOfPublication.bed44dab-0958-48e9-a8e5-cad6eede39b6

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    Synthesis of Volatile, Reactive Coinage Metal 5,5-Bicyclic Amidinates With Enhanced Thermal Stability for Chemical Vapor Deposition
    (Royal Society of Chemistry (RSC), 2019) Tong, Liuchuan; Gong, Xian; Feng, Jun; Gordon, Roy; Davis, Luke; Beth, Eugene
    Many microelectronic devices require thin films of silver or gold as wiring layers. We report silver(I) and gold(I) bicyclic amidinate complexes, wherein the constrained ligand geometry lessens the propensity for thermal decomposition. These new volatile compounds provide metallic films of silver and gold during CVD with hydrogen below 230 °C.
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    Chemical Vapor Deposition of Transparent, p-Type Cuprous Bromide Thin Films
    (American Chemical Society (ACS), 2021-02-09) Chang, Christina; Davis, Luke; Spear, Eliza; Gordon, Roy
    The semiconductors CuX (X = Cl, Br, or I) are high-mobility p-type transparent conductors, promising for use in thin film optoelectronic devices such as perovskite photovoltaics. These devices require smooth, pinhole free films that are tens of nanometers thick but uniform across tens of centimeters. Chemical vapor deposition (CVD), an established and scalable process, can provide excellent throughput, conformality, and uniformity on such large areas. However, no prior CVD method could produce continuous thin films of any cuprous halide. We have established such a method, preparing CuBr thin films by reaction between HBr gas and vinyltrimethylsilane(hexafluoroacetylacetonato)copper(I). Our method not only provides the desired device-quality films but also opens up the possibility of a general route to CVD of other metal halides.