Publication: Ion Implantation and Annealing of SrTiO3 and CaTiO3
Open/View Files
Date
1987
Published Version
Journal Title
Journal ISSN
Volume Title
Publisher
Materials Research Society
The Harvard community has made this article openly available. Please share how this access benefits you.
Citation
Aziz, Michael J., L. A. Boatner, J. Rankin, and C. W. White. 1987. Ion Implantation and Annealing of SrTiO3 and CaTiO3. Materials Research Society Symposium Proceedings 93: 9-13.
Research Data
Abstract
Ion implantation damage and thermal annealing results are presented for single crystals of SrTiO<sub>3</sub> and CaTiO<sub>3</sub>. The near-surface region of both of these materials can be made amorphous by low doses (~10<sup>15</sup>/cm<sup>2</sup>) of heavy ions (PB at 540 KeV). During annealing, the amorphous implanted region crystallizes epitaxially on the underlying single-crystal substrate. The kinetics of this solid-phase epitaxial recrystallization process have been measured by employing ion channeling techniques.
Description
Other Available Sources
Keywords
Terms of Use
This article is made available under the terms and conditions applicable to Other Posted Material (LAA), as set forth at Terms of Service