Publication: Nanometer Patterning with Ice
Loading...
Open/View Files
Date
2005
Published Version
Journal Title
Journal ISSN
Volume Title
Publisher
American Chemical Society
The Harvard community has made this article openly available. Please share how this access benefits you.
Citation
King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko. 2005. Nanometer patterning with ice. Nano Letters 5(6): 1157-1160.
Abstract
Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.
Description
Other Available Sources
Research Data
Keywords
Terms of Use
This article is made available under the terms and conditions applicable to Other Posted Material (LAA), as set forth at Terms of Service