Localized Ridge Wrinkling of Stiff Films on Compliant Substrates

Abstract

Wrinkling of thin stiff films on thick compliant elastomeric substrates subject to plane strain compression is considered for cases in which the substrate is pre-stretched prior to film attachment. Advanced wrinkling modes are investigated that evolve as the systems are compressed beyond the onset of the primary sinusoidal wrinkling mode. If the substrate pre-stretch is greater than about 40%, an advanced mode in the form of a series of well-spaced ridges separated by relatively flat film is observed in the simulations. Our experiments reveal a localization mode in the form of alternating packets of large and small amplitude wrinkles, but not ridges, while ridge formation has been observed in other recent experiments. Measurements of undulation amplitudes have been made for wrinkle fields of stiff films formed by oxidation of the surface of pre-stretched PDMS substrates. Simulations have been performed with a finite element model and an analytical film/substrate model. The formation of the ridge mode is a consequence of the altered nonlinearity of the substrate produced by the pre-stretch. The role of the tangential substrate stiffness in suppressing localization at the ridges is also highlighted. If there is no substrate pre-stretch, or if the substrate is pre-compressed, the primary sinusoidal mode gives way to an entirely different sequence of advanced modes usually entailing period doubling followed by folding. The nature of substrate nonlinearity that leads to ridges or folds is discussed.