Islands stretch test for measuring the interfacial fracture energy between a hard film and a soft substrate

Abstract

We present a technique for measuring the interfacial fracture energy, (\Gamma_i), between a hard thin film and a soft substrate. A periodic array of hard thin islands is fabricated on a soft substrate, which is then subjected to uniaxial tension under an optical microscope. When the applied strain reaches a critical value, delamination between the islands and the substrate starts from the edge of the islands. As the strain is increased, the interfacial cracks grow in a stable fashion. At a given applied strain, the width of the delaminated region is a unique function of the interfacial fracture energy. We have calculated the energy release rate driving the delamination as a function of delamination width, island size, island thickness, and applied strain. For a given materials system, this relationship allows determination of the interfacial fracture energy from a measurement of the delamination width. The technique is demonstrated by measuring the interfacial fracture energy of plasma-enhanced chemical vapor deposition SiNx islands on a polyimide substrate. We anticipate that this technique will find application in the flexible electronics industry where hard islands on soft substrates are a common architecture to protect active devices from fracture.