Publication: Low Temperature Atomic Layer Deposition of Tin Dioxide, SnO(_2)
Loading...
Open/View Files
Date
2010
Published Version
Journal Title
Journal ISSN
Volume Title
Publisher
The Harvard community has made this article openly available. Please share how this access benefits you.
Citation
Heo, Jaeyeong, Adam S. Hock, and Roy G. Gordon. 2010. Low temperature atomic layer deposition of tin dioxide, SnO\(_2\). Presentation slides. 10th International Conference on Atomic Layer Deposition. Seoul, South Korea.
Abstract
Description
Other Available Sources
Research Data
Keywords
Terms of Use
This article is made available under the terms and conditions applicable to Other Posted Material (LAA), as set forth at Terms of Service