Publication:
Secrets revealed — Spatially selective wetting of plasma-patterned periodic mesoporous organosilica

Thumbnail Image

Date

2012

Published Version

Journal Title

Journal ISSN

Volume Title

Publisher

Canadian Science Publishing
The Harvard community has made this article openly available. Please share how this access benefits you.

Research Projects

Organizational Units

Journal Issue

Citation

Wang, Wendong, Ian B. Burgess, Benjamin D. Hatton, Jack Alvarenga, and Joanna Aizenberg.2012. Secrets revealed — Spatially selective wetting of plasma-patterned periodic mesoporous organosilica. Canadian Journal of Chemistry 90, no. 12: 1063-1068. doi: 10.1139/v2012-092

Research Data

Abstract

We report a simple method to pattern wetting properties on thin films of periodic mesoporous organosilica (PMO). A hydrophobic methane PMO thin film was covered by masks and exposed to oxygen plasma to make the unmasked area hydrophilic. The wettability patterns could be revealed only when the films were immersed in water or exposed to moisture. We expect that our method would extend the utility of PMO to such areas as sensing and information security.

Description

Other Available Sources

Keywords

wetting, plasma, mesoporous materials, thin film

Terms of Use

This article is made available under the terms and conditions applicable to Open Access Policy Articles (OAP), as set forth at Terms of Service

Endorsement

Review

Supplemented By

Referenced By

Related Stories