Now showing items 1-2 of 2

    • New Ni Amidinate Source for ALD/CVD of NiNx, NiO and Ni 

      Li, Huazhi; Perera, Thiloma; Shenai, Deo V.; Li, Zhefeng; Gordon, Roy Gerald (2011)
      Ni materials in the form of NiNx, NiO or NiSi have been found to be particularly important in memory as well as logic applications. Nickel silicide (NiSi) is emerging as the choice material for contact applications in ...
    • \((Sn,Al)O_x\) Films Grown by Atomic Layer Deposition 

      Heo, Jae Yeong; Liu, Yiqun; Sinsermsuksakul, Prasert; Li, Zhefeng; Sun, Leizhi; Noh, Wontae; Gordon, Roy Gerald (American Chemical Society, 2011)
      \((Sn,Al)O_x\) composite films with various aluminum (Al) to tin (Sn) ratios were deposited using an atomic layer deposition technique. The chemisorption behavior of cyclic amide of tin(II) and trimethylaluminum were ...