Browsing FAS Scholarly Articles by Keyword "O2 exposure"

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    • Atomic Layer Deposition of Ruthenium Thin Films From an Amidinate Precursor 

      Wang, Hongtao; Gordon, Roy Gerald; Alvis, Roger; Ulfig, Robert M. (John Wiley & Sons, 2009-10-14)
      Ruthenium thin films were deposited by atomic layer deposition from bis(N,N’-di-tert-butylacetamidinato)ruthenium(II) dicarbonyl and O2. Highly conductive, dense and pure thin films can be deposited when oxygen exposure ...